Atomic Layer Deposition
Atomic Layer Deposition was invented more than 40 years ago. In recent years, it is deemed as one of the critical enabling technologies in the advanced nodes in semiconductor manufacturing industry.
In general, if substrate temperature is too low, the half-reaction could be incomplete. If the substrate temperature is high, desorption or decomposition can occur. To accurately realize the recipe temperature set points, carefully designed and implemented thermal instrumentation is required.
LumaSense offers two types of temperature instruments. One is the Fiber Optic Temperature monitoring solution based on the Luxtron Fluoroptic technology. This solution uses a fiber optic probe that is immune to plasma interference and has a temperature range of -100 °C to +330 °C. The other is a fiber optic radiation pyrometer and typically is used for temperature range above 50 °C but can handle very high temperature.
LumaSense is able to customize the design in specific applications.
Works in plasma enhanced system
FOT and GaAs Probes