Ascent AMS Pulsed and DC Power System
Stable Power Delivery for Extreme Arc Conditions and Highly Repeatable Films
特徴
- Arc Management System™ (AMS) technology — customer pre-sets for metal and ceramic targets
- Set Point Compensation™ technology
- Arc Sync® technology — primary/secondary up to 12 units
- Ethernet, EtherCAT®, DeviceNet®, Profibus, RS-232/485, Ethernet/IP, and analog communications
メリット
- Obtain high film quality and throughput
- Reduce film, substrate, and equipment damage
- Achieve stable throughput and power delivery under extreme arcing conditions
- Easily integrate and control
仕様
| 冷却: | Hybrid (air and water) |
|---|---|
| 出力周波数(MHz、kHz): | 0.5 to 5 kHz |
| 入力電圧 (V): | 400, 440, 480 VAC |
| 出力レベル(kW): | 30 to 60 kW |
| ラック幅: | Full rack |
| 高さ(インチ): | 6U |
| 出力電圧範囲 (V): | 400-1000 V |
| 通信インターフェース: | Ethernet, EtherCAT, DeviceNet, Profibus, RS-232/485, EtherNet/IP, and analog communications |
Featured Resources
Ascent® AMS Brochure
Ascent® AMS power supplies deliver stable, repeatable power, regardless of process material or cathode design.
Optimizing Glass Process Stability, Throughput with the PowerInsight by Advanced Energy™ IoT Solution
Optimizing Static Deposition Processes White Paper
Substrate Biasing for Sputter Deposition Processes
Explore the principles and practices of substrate biasing, examining its impact on thin-film characteristics and the various methods used to achieve optimal results.
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