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Reactive Sputtering Process Stability Reinforced by Advanced Energy’s Power Delivery Technology

6월 22, 2026

By Saeed Mirzaei

This blog explores how oxygen and water vapor dynamics shape plasma behavior and TiO₂ film quality in reactive sputtering. Using Advanced Energy’s Ascent AMS and Ascent DMS power supplies, AE experts demonstrate how advanced pulsed‑DC regulation stabilizes deposition despite fluctuating reactive conditions. The study introduces a unified p* parameter that correlates gas effects with deposition rate and optical properties, offering a predictive path to more uniform, high‑performance oxide coatings.

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Safety Requirements in Medical Equipment: Designing for BF and CF Classifications

3월 04, 2024

By Paul Kingsepp

IEC 60601-1: Safety Classifications for Medical Equipment

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Advanced Energy’s Year of Transformation

1월 31, 2024

By Peter Gillespie

AE 2023: Stronger, Agile & Innovative in Eng. & Ops

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New Safety Standards and Medical Power Implication of Transition to IEC 60601-1 Edition 3.2

1월 22, 2024

By Del Moses and Nesa Kandaiah

When certifying a medical product, updates to an industry standard can make for challenging times for medical equipment manufacturers, especially when a standard is costly to publish, impacting the cost of compliance as well.

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Raising the Bar on Bias

1월 07, 2024

By Juergen Braun

New Era of Ion Energy Distribution Control: Semiconductor

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Top 5 Medical Industry Trends from MEDICA 2023

12월 27, 2023

By Dermot Flynn

Advanced Energy recently exhibited at the MEDICA and COMPAMED trade fair on November 13-16 in Dusseldorf, Germany. This year, MEDICA and COMPAMED drew more than 6,000 exhibitors and over 83,000 attendees from the medical industry.

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Dynamic Reverse Pulsing – What About the Anode?

12월 04, 2023

By Gayatri Rane

A previous AE blog, Dynamic Reverse Pulsing – What About Duty Cycle?, discussed reactive sputter deposition of insulating thin films in large-area coaters, describing the benefits of using the Dynamic Reverse Pulse (DRP) power-delivery mode over the bipolar (BP) mode of dual magnetron sputtering. In DRP mode , dual targets are bipolar pulsed against an explicit anode and the duty cycle can be varied so that the polarity is positive on the target for a shorter time during pulsing. This allows clearing of charge build-up on the targets. In our studies, DRP mode showed increased deposition rate and reduced substrate temperature when compared to similar depositions with the BP mode.

Blog

Top 5 Takeaways from OCP 2023

11월 16, 2023

By Brian Korn

Last month marked our 6th year of engagement and partnership with the OCP community through the OCP Global Summit, which took place on Oct. 17 – 19 in San Jose, Calif. Our journey started with the ORv2 12V power shelf, and we’re now transitioning towards the next-generation 48V ORv3 power shelf.

Blog

Sputter Deposition of Indium Tin Oxide: To Pulse or Not to Pulse

10월 30, 2023

By Gayatri Rane

ITO Sputter Deposition from Compound Targets as TCO

Blog

Powering Electrosurgery: Precise Control and Delivery of RF Energy

10월 23, 2023

By Todd Huston

Medical applications have made use of radio frequency (RF) energy in the form of electromagnetic waves or electrical currents for over 125 years. The ability to transect and seal vessels and tissue effectively and safely, for example, is a critical surgical task with RF-based techniques being the gold standard for cutting and cauterizing.
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